<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3-mathml3.dtd">
<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" article-type="research-article" dtd-version="1.3" xml:lang="EN">
<front>
<journal-meta>
<journal-id journal-id-type="publisher-id">Front. Chem.</journal-id>
<journal-title-group>
<journal-title>Frontiers in Chemistry</journal-title>
<abbrev-journal-title abbrev-type="pubmed">Front. Chem.</abbrev-journal-title>
</journal-title-group>
<issn pub-type="epub">2296-2646</issn>
<publisher>
<publisher-name>Frontiers Media S.A.</publisher-name>
</publisher>
</journal-meta>
<article-meta>
<article-id pub-id-type="publisher-id">1635084</article-id>
<article-id pub-id-type="doi">10.3389/fchem.2025.1635084</article-id>
<article-version article-version-type="Corrected Version of Record" vocab="NISO-RP-8-2008"/>
<article-categories>
<subj-group subj-group-type="heading">
<subject>Original Research</subject>
</subj-group>
</article-categories>
<title-group>
<article-title>Electrodeposition of nanocrystalline Fe<sub>X</sub>Co<sub>1-X</sub> thin films from choline chloride&#x2013;urea deep eutectic solvents</article-title>
<alt-title alt-title-type="left-running-head">Wu et al.</alt-title>
<alt-title alt-title-type="right-running-head">
<ext-link ext-link-type="uri" xlink:href="https://doi.org/10.3389/fchem.2025.1635084">10.3389/fchem.2025.1635084</ext-link>
</alt-title>
</title-group>
<contrib-group>
<contrib contrib-type="author" corresp="yes">
<name>
<surname>Wu</surname>
<given-names>Tingjun</given-names>
</name>
<xref ref-type="aff" rid="aff1">
<sup>1</sup>
</xref>
<xref ref-type="corresp" rid="c001">&#x2a;</xref>
<uri xlink:href="https://loop.frontiersin.org/people/884455"/>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Writing &#x2013; original draft" vocab-term-identifier="https://credit.niso.org/contributor-roles/writing-original-draft/">Writing &#x2013; original draft</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Data curation" vocab-term-identifier="https://credit.niso.org/contributor-roles/data-curation/">Data curation</role>
</contrib>
<contrib contrib-type="author">
<name>
<surname>Kim</surname>
<given-names>Jiwon</given-names>
</name>
<xref ref-type="aff" rid="aff2">
<sup>2</sup>
</xref>
<uri xlink:href="https://loop.frontiersin.org/people/605488"/>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Writing &#x2013; review &amp; editing" vocab-term-identifier="https://credit.niso.org/contributor-roles/writing-review-editing/">Writing &#x2013; review &amp; editing</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="investigation" vocab-term-identifier="https://credit.niso.org/contributor-roles/investigation/">Investigation</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="conceptualization" vocab-term-identifier="https://credit.niso.org/contributor-roles/conceptualization/">Conceptualization</role>
</contrib>
<contrib contrib-type="author">
<name>
<surname>Choa</surname>
<given-names>Yong-Ho</given-names>
</name>
<xref ref-type="aff" rid="aff3">
<sup>3</sup>
</xref>
<uri xlink:href="https://loop.frontiersin.org/people/452741"/>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="conceptualization" vocab-term-identifier="https://credit.niso.org/contributor-roles/conceptualization/">Conceptualization</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Data curation" vocab-term-identifier="https://credit.niso.org/contributor-roles/data-curation/">Data curation</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Funding acquisition" vocab-term-identifier="https://credit.niso.org/contributor-roles/funding-acquisition/">Funding acquisition</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Writing &#x2013; review &amp; editing" vocab-term-identifier="https://credit.niso.org/contributor-roles/writing-review-editing/">Writing &#x2013; review &amp; editing</role>
</contrib>
<contrib contrib-type="author" corresp="yes">
<name>
<surname>Myung</surname>
<given-names>Nosang V.</given-names>
</name>
<xref ref-type="aff" rid="aff4">
<sup>4</sup>
</xref>
<xref ref-type="aff" rid="aff5">
<sup>5</sup>
</xref>
<xref ref-type="corresp" rid="c001">&#x2a;</xref>
<uri xlink:href="https://loop.frontiersin.org/people/93843"/>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Writing &#x2013; review &amp; editing" vocab-term-identifier="https://credit.niso.org/contributor-roles/writing-review-editing/">Writing &#x2013; review &amp; editing</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Funding acquisition" vocab-term-identifier="https://credit.niso.org/contributor-roles/funding-acquisition/">Funding acquisition</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="conceptualization" vocab-term-identifier="https://credit.niso.org/contributor-roles/conceptualization/">Conceptualization</role>
<role vocab="credit" vocab-identifier="https://credit.niso.org/" vocab-term="Project administration" vocab-term-identifier="https://credit.niso.org/contributor-roles/project-administration/">Project administration</role>
</contrib>
</contrib-group>
<aff id="aff1">
<label>1</label>
<institution>Xiamen Institute of Rare Earth Materials</institution>, <city>Xiamen</city>, <state>Fujian</state>, <country country="CN">China</country>
</aff>
<aff id="aff2">
<label>2</label>
<institution>Center for Advanced Materials, Institute for Advanced Engineering</institution>, <city>Yongin</city>, <state>Gyeonggi</state>, <country country="KR">Republic of Korea</country>
</aff>
<aff id="aff3">
<label>3</label>
<institution>Department of Materials Science and Chemical Engineering, Hanyang University</institution>, <city>Ansan-si</city>, <country country="KR">Republic of Korea</country>
</aff>
<aff id="aff4">
<label>4</label>
<institution>Department of Chemical and Biomolecular Engineering, University of Notre Dame</institution>, <city>Notre Dame</city>, <state>IN</state>, <country country="US">United States</country>
</aff>
<aff id="aff5">
<label>5</label>
<institution>Department of Chemistry and Biochemistry, University of Notre Dame</institution>, <city>Notre Dame</city>, <state>IN</state>, <country country="US">United States</country>
</aff>
<author-notes>
<corresp id="c001">
<label>&#x2a;</label>Correspondence: Tingjun Wu, <email xlink:href="tingjun.wu@hotmail.com">tingjun.wu@hotmail.com</email>; Nosang V. Myung, <email xlink:href="nmyung@nd.edu">nmyung@nd.edu</email>
</corresp>
</author-notes>
<pub-date publication-format="electronic" date-type="pub" iso-8601-date="2025-09-01">
<day>01</day>
<month>09</month>
<year>2025</year>
</pub-date>
<pub-date publication-format="electronic" date-type="corrected" iso-8601-date="2025-09-11">
<day>11</day>
<month>09</month>
<year>2025</year>
</pub-date>
<pub-date publication-format="electronic" date-type="collection">
<year>2025</year>
</pub-date>
<volume>13</volume>
<elocation-id>1635084</elocation-id>
<history>
<date date-type="received">
<day>25</day>
<month>05</month>
<year>2025</year>
</date>
<date date-type="accepted">
<day>25</day>
<month>07</month>
<year>2025</year>
</date>
</history>
<permissions>
<copyright-statement>Copyright &#xa9; 2025 Wu, Kim, Choa and Myung.</copyright-statement>
<copyright-year>2025</copyright-year>
<copyright-holder>Wu, Kim, Choa and Myung</copyright-holder>
<license>
<ali:license_ref start_date="2025-09-01">https://creativecommons.org/licenses/by/4.0/</ali:license_ref>
<license-p>This is an open-access article distributed under the terms of the <ext-link ext-link-type="uri" xlink:href="https://creativecommons.org/licenses/by/4.0/">Creative Commons Attribution License (CC BY)</ext-link>. The use, distribution or reproduction in other forums is permitted, provided the original author(s) and the copyright owner(s) are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.</license-p>
</license>
</permissions>
<abstract>
<p>Fe<sub>x</sub>Co<sub>1-x</sub> thin films were electrodeposited from a choline&#x2013;urea deep eutectic solvent (DES) containing Fe<sup>3&#x2b;</sup> and Co<sup>2&#x2b;</sup> ions under ambient conditions. Anomalous co-deposition was observed, with Fe preferentially depositing over Co. With higher cathodic potential, the film&#x2019;s morphology shifted from smooth to nodular. X-ray diffraction (XRD) analysis showed iron oxide impurities at lower overpotential and temperatures (e.g., &#x3c;&#x2212;0.9&#xa0;V at 70&#x2009;&#xb0;C), while impurity-free, nanocrystalline Co<sub>50</sub>Fe<sub>50</sub> films had formed at higher temperatures (e.g., 130&#x2009;&#xb0;C). The films exhibited a body-centered cubic (BCC) structure with (110) preferred orientation and grain sizes of 30 nm&#x2013;40&#xa0;nm.</p>
</abstract>
<kwd-group>
<kwd>deep eutectic solvent</kwd>
<kwd>choline chloride</kwd>
<kwd>urea</kwd>
<kwd>electrodeposition</kwd>
<kwd>CoFe</kwd>
<kwd>soft magnetic materials</kwd>
</kwd-group>
<funding-group>
<funding-statement>The author(s) declare that financial support was received for the research and/or publication of this article. JK likes to acknowledges the funding suppport by the Industrial Innovation Infrastructure Construction Project (RS-2024-00435498) and Demand-Driven Next-Generation Researchers Industrial Innovation Technology Development Program (RS-2025-16063993) funded by Ministry of Trade, Industry and E nergy (MOTIE, Korea), Republic of Korea.</funding-statement>
</funding-group>
<counts>
<fig-count count="9"/>
<table-count count="0"/>
<equation-count count="1"/>
<ref-count count="91"/>
<page-count count="00"/>
</counts>
<custom-meta-group>
<custom-meta>
<meta-name>section-in-acceptance</meta-name>
<meta-value>Electrochemistry</meta-value>
</custom-meta>
</custom-meta-group>
</article-meta>
</front>
<body>
<sec id="s1" sec-type="intro">
<title>Introduction</title>
<p>Soft magnetic materials, which can easily be magnetized or demagnetized, have many applications from magnetic storage media to recording head (<xref ref-type="bibr" rid="B40">Ikeda et al., 2010</xref>; <xref ref-type="bibr" rid="B55">Okada et al., 2002</xref>; <xref ref-type="bibr" rid="B56">Okada et al., 2004</xref>; <xref ref-type="bibr" rid="B62">Parkin et al., 2008</xref>; <xref ref-type="bibr" rid="B69">Sato et al., 2012</xref>) to spintronic-based magnetic racetrack memories (<xref ref-type="bibr" rid="B5">Arnold et al., 2006</xref>; <xref ref-type="bibr" rid="B42">Judy and Muller, 1996</xref>; <xref ref-type="bibr" rid="B49">Lenz, 1990</xref>), inductors (<xref ref-type="bibr" rid="B64">Popovic et al., 1996</xref>), actuators (<xref ref-type="bibr" rid="B11">Bozorth, 1951</xref>), sensors (<xref ref-type="bibr" rid="B51">Liu et al., 2004</xref>; <xref ref-type="bibr" rid="B70">Scheunert et al., 2016</xref>), and microelectromechanical systems (MEMS) and nanoelectromechanical systems (NEMS) (<xref ref-type="bibr" rid="B20">Cooper et al., 2005</xref>; <xref ref-type="bibr" rid="B44">Kim et al., 2014</xref>; <xref ref-type="bibr" rid="B57">Osaka, 2000</xref>; <xref ref-type="bibr" rid="B67">Romankiw, 1997</xref>). The most desirable soft magnetic properties are high saturation magnetization (M<sub>s</sub>), high permeability, low coercivity (H<sub>c</sub>), and low core loss. Thus, most soft magnetic materials are derived from the iron group metals (i.e., Ni, Fe, and Co).</p>
<p>Fe<sub>X</sub>Co<sub>1-X</sub> binary alloys are important soft magnetic materials with excellent magnetic properties, including relatively low coercivity (&#x223c;2&#xa0;Oe), low hysteresis loss, high electric permeability, high saturation magnetization (e.g., M<sub>s</sub> of 2.4&#xa0;T for Co<sub>50</sub>Fe<sub>50</sub>) (<xref ref-type="bibr" rid="B76">Shao et al., 2007</xref>; <xref ref-type="bibr" rid="B77">Shao et al., 2010</xref>), and relatively high electrical resistance (<xref ref-type="bibr" rid="B4">Andricacos and Robertson, 1998</xref>; <xref ref-type="bibr" rid="B12">Brankovic, 2012</xref>; <xref ref-type="bibr" rid="B19">Burkert et al., 2004</xref>; <xref ref-type="bibr" rid="B20">Cooper et al., 2005</xref>; <xref ref-type="bibr" rid="B25">Ehrfeld, 2003</xref>; <xref ref-type="bibr" rid="B36">Ghemes et al., 2017</xref>; <xref ref-type="bibr" rid="B36">Ghemes et al., 2017</xref>; <xref ref-type="bibr" rid="B46">Kohn et al., 2001</xref>; <xref ref-type="bibr" rid="B68">Sahari et al., 2006</xref>; <xref ref-type="bibr" rid="B80">Turgut et al., 1998</xref>; <xref ref-type="bibr" rid="B89">Zhan et al., 2002</xref>). Especially, nanocrystalline Fe<sub>X</sub>Co<sub>1-X</sub> alloys are highly desirable materials for high-temperature applications, such as magnetic bearings for high-speed motor, flywheels (<xref ref-type="bibr" rid="B87">Yu et al., 2000</xref>), and gas turbine engines (<xref ref-type="bibr" rid="B31">Fingers et al., 1999</xref>; <xref ref-type="bibr" rid="B37">Giri et al., 2000</xref>; <xref ref-type="bibr" rid="B47">Kortus et al., 2002</xref>; <xref ref-type="bibr" rid="B73">Shang C. H. et al., 2000</xref>; <xref ref-type="bibr" rid="B74">Shang C.-H. et al., 2000</xref>; <xref ref-type="bibr" rid="B81">Turgut et al., 2000</xref>).</p>
<p>Although many synthesis methods are available for the preparation of Fe<sub>X</sub>Co<sub>1-X</sub> films (<xref ref-type="bibr" rid="B6">Ashar, 1997</xref>; <xref ref-type="bibr" rid="B75">Shao et al., 2003</xref>), electrodeposition is an important processing technology because of its low capital/equipment and operating cost, high yield, low energy consumption, fast deposition rates, ability to handle complex geometries, high scalability, and capability (<xref ref-type="bibr" rid="B21">Dini, 1993</xref>; <xref ref-type="bibr" rid="B83">Wu et al., 2016</xref>; <xref ref-type="bibr" rid="B84">Wu et al., 2017</xref>). In addition, the material properties (e.g., morphology, composition, crystallinity, and crystal structures) can be readily tailored by controlling the electrodeposition parameters (<xref ref-type="bibr" rid="B7">Bai and Hu, 2003</xref>; <xref ref-type="bibr" rid="B45">Kockar et al., 2010</xref>; <xref ref-type="bibr" rid="B48">Lallemand et al., 2004</xref>).</p>
<p>Electrodeposition of Fe<sub>X</sub>Co<sub>1-X</sub> has been investigated by many groups. Most of Fe<sub>X</sub>Co<sub>1-X</sub> binary alloys were electrodeposited in acidic aqueous baths, with Fe<sup>2&#x2b;</sup> and Co<sup>2&#x2b;</sup> being used as precursors in aqueous media. In these works, solution parameters such as pH (<xref ref-type="bibr" rid="B14">Brankovic et al., 2006</xref>) and additives (<xref ref-type="bibr" rid="B16">Brankovic et al., 2008</xref>) and electrodeposition parameters such as deposition potential (<xref ref-type="bibr" rid="B17">Brankovic et al., 2009</xref>) were adjusted to control the film morphology and microstructures, which resulted in different magnetic properties. With respect to acidic baths, several major challenges need to be overcome to achieve high saturation magnetization (M<sub>s</sub> &#x2265;2.4&#xa0;T). First, Fe<sup>3&#x2b;</sup> ions are always present in the aqueous solution because of the oxidation of Fe<sup>2&#x2b;</sup> either by the dissolved oxygen from the air or by the anode surface during the Fe<sub>X</sub>Co<sub>1-X</sub> thin-film electrodeposition (<xref ref-type="bibr" rid="B27">Elhalawaty et al., 2011</xref>; <xref ref-type="bibr" rid="B28">Elhalawaty et al., 2012</xref>; <xref ref-type="bibr" rid="B50">Lide, 2005</xref>; <xref ref-type="bibr" rid="B52">Mehrizi et al., 2012</xref>; <xref ref-type="bibr" rid="B90">Zhang and Ivey, 2004</xref>). Moreover, electrodeposition of Fe<sub>X</sub>Co<sub>1-X</sub> films in an aqueous solution is a process where the dramatic hydrogen gas evolution reaction occurs in parallel, leading to the increase in local pH at the electrode/solution interface and precipitation of insoluble metal hydroxides, especially Fe(OH)<sub>3</sub> because of its low solubility (<xref ref-type="bibr" rid="B52">Mehrizi et al., 2012</xref>), in the Fe<sub>X</sub>Co<sub>1-X</sub> films (<xref ref-type="bibr" rid="B16">Brankovic et al., 2008</xref>; <xref ref-type="bibr" rid="B90">Zhang and Ivey, 2004</xref>). Precipitation of non-magnetic metal hydroxide particles would decrease the saturation magnetization of the aqueous solution and shorten the bath life (<xref ref-type="bibr" rid="B16">Brankovic et al., 2008</xref>; <xref ref-type="bibr" rid="B61">Osaka et al., 2003</xref>). It was reported that a critical concentration of Fe<sup>3&#x2b;</sup> &#x3e;1.2&#xa0;mM in solution results in a dramatic decrease in the M<sub>s</sub> value of the CoFe alloy by &#x223c;44% (<xref ref-type="bibr" rid="B35">George et al., 2013</xref>; <xref ref-type="bibr" rid="B79">Tabakovic et al., 2006</xref>). In addition, the oxygen content in a CoFe film should remain lower than 1%&#x2013;3%&#xa0;to reach a high saturation magnetization (<xref ref-type="bibr" rid="B16">Brankovic et al., 2008</xref>; <xref ref-type="bibr" rid="B27">Elhalawaty et al., 2011</xref>; <xref ref-type="bibr" rid="B33">Gao et al., 2006</xref>; <xref ref-type="bibr" rid="B66">Riemer et al., 2009</xref>). As a consequence, the incorporation of Fe(OH)<sub>3</sub> in the deposit is the major obstacle in obtaining Fe<sub>X</sub>Co<sub>1-X</sub> films and nanostructures with high saturation magnetization (<xref ref-type="bibr" rid="B76">Shao et al., 2007</xref>) and low coercivity (<xref ref-type="bibr" rid="B88">Yue et al., 2009</xref>). The accumulation of Fe<sup>3&#x2b;</sup> ions in solution is normally prevented by continuous chemical reduction (e.g., L-ascorbic acid) of Fe<sup>3&#x2b;</sup> ions to Fe<sup>2&#x2b;</sup> ions (<xref ref-type="bibr" rid="B2">Abd El-Halim and Fawzy, 1993</xref>; <xref ref-type="bibr" rid="B3">Almasi Kashi et al., 2010</xref>; <xref ref-type="bibr" rid="B18">Brener, 1994</xref>; <xref ref-type="bibr" rid="B26">Elbaile et al., 2012</xref>; <xref ref-type="bibr" rid="B30">Esmaeily et al., 2013</xref>; <xref ref-type="bibr" rid="B39">Huang et al., 2010</xref>; <xref ref-type="bibr" rid="B41">Ji et al., 2014</xref>; <xref ref-type="bibr" rid="B43">Kim et al., 2012</xref>; <xref ref-type="bibr" rid="B65">Ramazani et al., 2011</xref>; <xref ref-type="bibr" rid="B72">Schlesinger and Paunovic, 2011</xref>; <xref ref-type="bibr" rid="B82">Viqueira et al., 2015</xref>; <xref ref-type="bibr" rid="B86">Yang et al., 2010</xref>). The second challenge in the electrodeposition of Fe<sub>X</sub>Co<sub>1-X</sub> films in an aqueous solution is that they undergo anomalous co-deposition, in which the less noble metal (i.e., Fe) deposits preferentially (<xref ref-type="bibr" rid="B59">Osaka et al., 1999a</xref>; <xref ref-type="bibr" rid="B63">Popov et al., 1993</xref>; <xref ref-type="bibr" rid="B71">Schlesinger and Paunovic, 2000</xref>). Additionally, additives were normally used in aqueous solution to improve the brightness and crystal structure, achieve smaller grain size, and reduce the residual stresses in the deposit (<xref ref-type="bibr" rid="B15">Brankovic et al., 2007</xref>; <xref ref-type="bibr" rid="B59">Osaka et al., 1999a</xref>; <xref ref-type="bibr" rid="B61">Osaka et al., 2003</xref>). However, additive molecules or molecular fragments can be found in the deposits as well (<xref ref-type="bibr" rid="B13">Brankovic et al., 2005</xref>; <xref ref-type="bibr" rid="B15">Brankovic et al., 2007</xref>; <xref ref-type="bibr" rid="B24">Edwards, 1962</xref>; <xref ref-type="bibr" rid="B32">Frankel et al., 1993</xref>; <xref ref-type="bibr" rid="B34">George et al., 2008</xref>). For example, the existence of sulfur in the magnetic deposit from saccharin as an additive occurs either via saccharin adsorption&#x2013;electroreduction or via its physical incorporation during the deposit growth (<xref ref-type="bibr" rid="B60">Osaka et al., 1999b</xref>; <xref ref-type="bibr" rid="B61">Osaka et al., 2003</xref>). The significant presence of the interstitials, such as boron, sulfur, metal sulfides, or S-containing organic molecules, can cause a deterioration in the alloy&#x2019;s magnetic performance and corrosion resistance (<xref ref-type="bibr" rid="B57">Osaka, 2000</xref>; <xref ref-type="bibr" rid="B58">Osaka et al., 1998</xref>; <xref ref-type="bibr" rid="B78">Smith et al., 2014</xref>).</p>
<p>Deep eutectic solvents (DESs), a class of ionic solutions closely related to ionic liquids but contain organic components (e.g., urea, amide, and acid), have emerged as new electrolytes for electrodeposition because of their relatively low vapor pressure; high tolerance of humidity; good thermo-stability; high solubility of metal precursors including metal salts, metal oxides, and metal hydroxides (<xref ref-type="bibr" rid="B1">Abbott et al., 2003</xref>; <xref ref-type="bibr" rid="B9">Binnemans et al., 2015</xref>; <xref ref-type="bibr" rid="B14">Brankovic et al., 2006</xref>; <xref ref-type="bibr" rid="B16">Brankovic et al., 2008</xref>); and greater deposition potential windows compared to aqueous electrolytes (<xref ref-type="bibr" rid="B17">Brankovic et al., 2009</xref>). Other advantages of DESs compared to aqueous bath have been highlighted by many authors (<xref ref-type="bibr" rid="B10">Bockris and Conway, 1975</xref>; <xref ref-type="bibr" rid="B23">Dulal et al., 2007</xref>).</p>
<p>
<xref ref-type="bibr" rid="B53">Miller et al. (2017)</xref> investigated electrodeposition of iron thin films from choline chloride&#x2013;ethylene glycol, with FeCl<sub>3</sub> as the iron precursor. They observed that the iron complex is strongly dependent on the chloride-to-iron ratio. For example, when the ratio is greater than 4, [FeCl<sub>4</sub>]<sup>&#x2212;</sup> and [FeCl<sub>4</sub>]<sup>&#x2212;2</sup> are dominant iron complexes, whereas ethylene glycol forms a complex with iron when the ratio is less than 4 (<xref ref-type="bibr" rid="B29">Endres et al., 2017</xref>). Yanai et al. reported the galvanostatic deposition of Fe<sub>X</sub>Co<sub>1-X</sub> alloys at a fixed current density of 67&#xa0;mA/cm<sup>2</sup> from choline chloride&#x2013;ethylene glycol electrolytes with FeCl<sub>2</sub> and CoCl<sub>2</sub> as metal precursors at 100&#x2009;&#xb0;C (<xref ref-type="bibr" rid="B85">Yanai et al., 2015</xref>). They demonstrated the ability to for electrodeposition of smooth Fe<sub>X</sub>Co<sub>1-X</sub> thin films at high current efficiency (&#x3e;90%). The magnetic saturation of the deposits was in good agreement with the Slater&#x2013;Pauling curve.</p>
<p>Fe<sub>X</sub>Co<sub>1-X</sub> thin films have been systematically electrodeposited in the choline chloride&#x2013;urea DES with FeCl<sub>3</sub> and CoCl<sub>2</sub> as precursors. Unlike other reported data, various electroanalytical methods including linear sweep voltammograms (LSVs) and chronoamperograms (CAs) were utilized to investigate the electrodeposition mechanism. Furthermore, Fe<sub>X</sub>Co<sub>1-X</sub> films were synthesized using a potentiostatic method under varying potentials and temperatures, and their effects on the composition, morphology, crystal structures, and magnetic properties were systematically investigated.</p>
</sec>
<sec id="s2">
<title>Experimental procedure</title>
<p>The DES was prepared by mixing the choline chloride and urea (1:2 ratio) at 80&#x2009;&#xb0;C until completely liquefied. Additionally, anhydrous cobalt chloride (CoCl<sub>2</sub>) and anhydrous iron chloride (FeCl<sub>3</sub>) were added and dissolved in the DES. The concentrations of FeCl<sub>3</sub> and CoCl<sub>2</sub> were fixed at 85 and 15&#xa0;mM, respectively.</p>
<p>Electrodeposition experiments were performed in a conventional three-electrode cell using a platinum-coated silicon wafer as the working electrode. Platinum-coated titanium stripes and silver were used as the counter and reference electrodes, respectively. The total charge was fixed at 6&#x2009;C. Linear sweep voltammetry (LSV) was conducted to investigate the electrodeposition mechanisms of Fe<sub>X</sub>Co<sub>1-X</sub> with a fixed scan rate of 1&#xa0;mV/s. The effect of the applied potential and temperature was investigated by varying the applied potential from &#x2212;0.7 to &#x2212;1.0&#xa0;V and the temperature from 70&#x2009;&#xb0;C to 130&#x2009;&#xb0;C.</p>
<p>The morphology, composition, and crystal orientation of tellurium films were investigated by scanning electron microscopy (SEM, TESCAN VEGA), energy-dispersive spectroscopy (EDX, Ametek), and X-ray diffraction (XRD, PANalytical Empyrean) with 0.026&#xb0; increments. The average grain size was determined using the Scherrer equation. The current efficiency (CE) was determined by measuring the mass of the electrodeposited Fe<sub>X</sub>Co<sub>1-X</sub> films divided by the mass calculated from the charge based on CAs.</p>
</sec>
<sec sec-type="results|discussion" id="s3">
<title>Results and discussion</title>
<p>
<xref ref-type="fig" rid="F1">Figure 1</xref> shows the temperature-dependent linear sweep voltammograms of electrolytes containing CoCl<sub>2</sub> (I), FeCl<sub>3</sub> (II), and CoCl<sub>2</sub> and FeCl<sub>3</sub> (III) and that without metal salts (IV) from 70&#x2009;&#xb0;C to 130&#x2009;&#xb0;C. In the absence of metal salts, the cathodic current density was relatively low, which indicates that there was a minor side reaction due to the decomposition of urea, where the onset potential of DES decomposition shifted positively from &#x2212;0.56, &#x2212;0.50, and &#x2212;0.44&#xa0;V as the temperature increased from 70&#x2009;&#xb0;C, 100&#x2009;&#xb0;C, and 130&#x2009;&#xb0;C, respectively. In the presence of metal salts, the current density significantly increased with increasing temperature at a fixed potential. For example, the electrolyte containing only CoCl<sub>2</sub> as metal ions showed a reduction peak at the applied potential of approximately &#x2212;0.8&#xa0;V, which represents the electrochemical reduction of Co<sup>2&#x2b;</sup> to Co(s) (blue curve). The electrolyte only containing FeCl<sub>3</sub> showed a cathodic peak at the applied potential of approximately &#x2212;1.0V, which represents the electrochemical reduction of Fe<sup>&#x2b;3</sup> to Fe(s). As expected, the electrolyte containing both CoCl<sub>2</sub> and FeCl<sub>3</sub> shows two cathodic peaks. Additionally, at a fixed applied potential of &#x2212;0.8 V, the reduction current density of Co increased from &#x2212;0.2 to &#x2212;0.61 to &#x2212;2.5&#xa0;mA&#xa0;cm<sup>&#x2212;2</sup>, the current density of Fe increased from &#x2212;0.1 to &#x2212;1.4 to &#x2212;3.4&#xa0;mA&#xa0;cm<sup>&#x2212;2</sup>, and the current density of Fe<sub>X</sub>Co<sub>1-X</sub> increased from &#x2212;0.55 to &#x2212;1.9 to 5.0&#xa0;mA&#xa0;cm<sup>&#x2212;2</sup> as the temperature increased from 70&#x2009;&#xb0;C to 100&#x2009;&#xb0;C to 130&#xa0;&#xb0;C.</p>
<fig id="F1" position="float">
<label>FIGURE 1</label>
<caption>
<p>Linear sweep voltammograms for Co, Fe, and CoFe electrodepositions in choline chloride&#x2013;urea at different temperatures: <bold>(A)</bold> 70&#x2009;&#xb0;C; <bold>(B)</bold>: 100&#x2009;&#xb0;C; <bold>(C)</bold>: 130&#x2009;&#xb0;C with (I) 15&#xa0;mM CoCl<sub>2</sub>; (II) 85&#xa0;mM FeCl<sub>3</sub>; (III) 15&#xa0;mM CoCl<sub>2</sub> &#x2b; 85&#xa0;mM FeCl<sub>3</sub>; (IV) only DES solvent. The scan rate was fixed at 1&#xa0;mV/s using a silver wire as the reference electrode. As deposition temperature increased, the deposition rate of iron and cobalt significantly increased.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g001.tif">
<alt-text content-type="machine-generated">Three plots labeled A, B, and C display current density versus potential. Each plot has four colored lines representing different conditions, labeled I, II, III, and IV. The y-axis shows current density in milliamps per square centimeter, and the x-axis shows potential in volts versus silver or volts. Plot A has a range from zero to negative four for current density, Plot B from zero to negative sixteen, and Plot C from zero to negative sixteen. Plots exhibit varied line behavior across different potentials.</alt-text>
</graphic>
</fig>
<p>
<xref ref-type="fig" rid="F1">Figure 1A</xref> shows that when the applied potential changed from &#x2212;0.7 to &#x2212;0.8 V, the average current density of Co increased from &#x2212;0.07 to &#x2212;0.20&#xa0;mA&#xa0;cm<sup>&#x2212;2</sup>, but when the applied potential further varied to &#x2212;0.9 and &#x2212;1.0 V, the current density of Co deposition remained at approximately 0.22&#xa0;mA&#xa0;cm<sup>&#x2212;2</sup>. As shown in the LSV curve I in <xref ref-type="fig" rid="F1">Figure 1A</xref>, in the applied potential range of &#x2212;0.8 to &#x2212;1.0 V, the electrodeposition of Co reached a limiting current, where the electrochemical reduction reaction altered from kinetic control to mass transfer control. For iron electrodeposition at 70&#x2009;&#xb0;C, the current density continuously increases when the applied potential becomes more negative (<xref ref-type="fig" rid="F1">Figure 1A</xref>; curve II). This is probably the reason why when the applied potential became more negative, the Fe content increased. In the acidic baths, anomalous co-deposition is observed, and Fe, the less noble metal, is deposited preferentially (<xref ref-type="bibr" rid="B23">Dulal et al., 2007</xref>). In DES, the same phenomenon was observed. For example, at an applied potential of &#x2212;0.8&#xa0;V at 70&#x2009;&#xb0;C, according to the LSV data (<xref ref-type="fig" rid="F1">Figure 1A</xref>), the current density of Co and Fe deposition was &#x2212;0.20 and &#x2212;0.11&#xa0;mA&#xa0;cm<sup>&#x2212;2</sup>, respectively. However, the Fe content of the Fe<sub>X</sub>Co<sub>1-X</sub> film deposited at &#x2212;0.8 V and 70&#x2009;&#xb0;C is 56%, which means that the less noble metal (i.e., Fe) was preferentially electrodeposited.</p>
<p>It is well-known that the magnetic properties of Fe<sub>X</sub>Co<sub>1-X</sub> films are greatly affected by their compositions and microstructures (<xref ref-type="bibr" rid="B23">Dulal et al., 2007</xref>; <xref ref-type="bibr" rid="B54">Natter and Hempelmann, 1996</xref>; <xref ref-type="bibr" rid="B83">Wu et al., 2016</xref>); thus, a reliable control of the composition and microstructure is essential. The effect of the applied potential on electrodeposition of Fe<sub>X</sub>Co<sub>1-X</sub> thin films was investigated under potentiostatic conditions at 70&#x2009;&#xb0;C. As shown in the CAs (<xref ref-type="fig" rid="F2">Figure 2</xref>), current transients are relatively constant at the low applied potential of &#x2212;0.7 and &#x2212;0.8&#xa0;V. However, at a higher applied potential (e.g., &#x2212;0.9 and &#x2212;1.0&#xa0;V), the current transients started to fluctuate.</p>
<fig id="F2" position="float">
<label>FIGURE 2</label>
<caption>
<p>Chronoamperograms of Fe<sub>x</sub>Co<sub>1-x</sub> electrodeposition at different applied potentials: (I) &#x2212;0.7 V; (II) &#x2212;0.8 V; (III) &#x2212;0.9 V; (IV) &#x2212;1.0&#xa0;V. Temperature and the applied charge were fixed at 70&#x2009;&#xb0;C and 6&#x2009;&#xb0;C, respectively. A silver wire was used as the reference electrode. The deposition current increased with an increase in cathodic potential.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g002.tif">
<alt-text content-type="machine-generated">Graph depicting current density versus time with four colored lines representing different data sets. Line I (black) shows constant current near zero. Line II (red) stabilizes around negative zero point five. Line III (blue) stabilizes near negative one. Line IV (orange) fluctuates around negative one point five. Time is marked from zero to four hundred minutes on the x-axis.</alt-text>
</graphic>
</fig>
<p>
<xref ref-type="fig" rid="F3">Figure 3</xref> shows the top (top row) and cross-sectional (bottom row) images of electrodeposition of Fe<sub>X</sub>Co<sub>1-X</sub> thin films. At an applied potential of &#x2212;0.7 to &#x2212;0.9 V, the cross-sectional images (<xref ref-type="fig" rid="F3">Figure 3</xref> bottom row) showed that the electrodeposited films were compact with nodular surface morphology (<xref ref-type="fig" rid="F3">Figure 3</xref> top row). The nodular size increases with increasing applied potential. At an applied potential of &#x2212;1.0 V, the morphology changed to a nanorod array with the average diameter of approximately 400&#xa0;nm. According to the LSV curve III in <xref ref-type="fig" rid="F1">Figure 1A</xref>, when the applied potential was more negative than &#x2212;0.96 V, the deposition current reached a limiting current, indicating that mass transfer of metal ions limits the electrochemical reaction. Consequently, with the applied potential of &#x2212;1.0 V, the morphology of electrodeposited Fe<sub>X</sub>Co<sub>1-X</sub> was no longer a compact film. Fe<sub>X</sub>Co<sub>1-X</sub> deposited in DES at &#x2212;1.0&#xa0;V showed a nanorod array instead of a porous or dendritic morphology, which are typically observed in electrodeposits under mass transfer limits (<xref ref-type="bibr" rid="B23">Dulal et al., 2007</xref>).</p>
<fig id="F3" position="float">
<label>FIGURE 3</label>
<caption>
<p>SEM images of Fe<sub>x</sub>Co<sub>1-x</sub> electrodeposited at different applied potentials: <bold>(A)</bold> &#x2212;0.7 V; <bold>(B)</bold> &#x2212;0.8 V; <bold>(C)</bold> &#x2212;0.9 V; <bold>(D)</bold> &#x2212;1.0&#xa0;V with 15&#xa0;mM CoCl<sub>2</sub> &#x2b; 85&#xa0;mM FeCl<sub>3</sub> at the temperature of 70&#x2009;&#xb0;C. The top row images are the cross-sectional view, and the bottom row images are the top view. The length bars represent 2 microns. The morphology significantly changed with applied potential from smooth to nodular morphology.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g003.tif">
<alt-text content-type="machine-generated">Microscopic images showing surface and cross-sectional views of samples labeled A through D. The top row displays surface textures, with increasing particle density from A to D. The bottom row shows cross-sectional views corresponding to each sample, highlighting structural differences in layers. Scale bars are present for reference.</alt-text>
</graphic>
</fig>
<p>The electrodeposition temperature was found to significantly affect the morphology and magnetic properties of electrodeposited films (<xref ref-type="bibr" rid="B23">Dulal et al., 2007</xref>; <xref ref-type="bibr" rid="B54">Natter and Hempelmann, 1996</xref>). The effect of temperature on the electrodeposition of Fe<sub>X</sub>Co<sub>1-X</sub> was investigated at the applied potential of &#x2212;0.9&#xa0;V by varying the temperature from 70&#x2009;&#xb0;C to 130&#x2009;&#xb0;C. The CA curves at different temperatures (i.e., 70&#x2009;&#xb0;C, 100&#x2009;&#xb0;C, and 130&#x2009;&#xb0;C) are shown in <xref ref-type="fig" rid="F3">Figure 3</xref>. According to the figure, the current density increased with increasing reaction temperature, and the CA curves fluctuated at higher temperatures. The effects of the reaction temperature on the morphology of Fe<sub>X</sub>Co<sub>1-X</sub> films are presented by SEM images in <xref ref-type="fig" rid="F4">Figure 4</xref>. As shown in the figure, the surface morphology of the films was smoother when the temperature was increased from 70&#x2009;&#xb0;C to 130&#x2009;&#xb0;C.</p>
<fig id="F4" position="float">
<label>FIGURE 4</label>
<caption>
<p>SEM images of Fe<sub>x</sub>Co<sub>1-x</sub> electrodeposited at different temperatures: <bold>(A)</bold> 70&#x2009;&#xb0;C; <bold>(B)</bold> 100&#x2009;&#xb0;C; <bold>(C)</bold> 130&#x2009;&#xb0;C with 15&#xa0;mM CoCl<sub>2</sub> &#x2b; 85&#xa0;mM FeCl<sub>3</sub> at the applied potential of &#x2212;0.9&#xa0;V. The top row images are the cross-sectional view, and the bottom row images are the top view. The length bars represent 2 microns. As the deposition temperature increased, the film&#x2019;s morphology became more smoother.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g004.tif">
<alt-text content-type="machine-generated">Microscopic images showing surface and cross-sectional views of polymer films labeled A, B, and C. The top row displays surface textures, with A having a rough, granular appearance, B smoother, and C almost featureless. The bottom row exhibits cross-sections of the films, illustrating varying thicknesses and uniformity. Scale bars are visible for reference.</alt-text>
</graphic>
</fig>
<p>The effects of the applied potential and temperature on Fe content are shown in <xref ref-type="fig" rid="F5">Figure 5</xref>. At 70&#x2009;&#xb0;C, the Fe content increased from 38&#xa0;at. % to 56&#xa0;at. %, when the applied potential was varied from &#x2212;0.7 to &#x2212;0.8 V; when the applied potential further increased to &#x2212;0.9 V, the Fe content increased slightly to 57&#xa0;at. %; however, at the applied potential of &#x2212;1.0 V, the Fe content decreased to 54&#xa0;at. %. At 100 <sup>o</sup>C, the Fe content increased from 47&#xa0;at. % to 53&#xa0;at. % when the applied potential was changed from &#x2212;0.7 to &#x2212;0.8 V; however, the Fe content remained at 52&#xa0;at. %, when the applied potential was changed from &#x2212;0.9 to &#x2212;1.0&#xa0;V. At 130&#x2009;&#xb0;C, the Fe content increased significantly from 45 to 51&#xa0;at. %, when the applied potential was changed from &#x2212;0.7 to &#x2212;0.8 V; however, when the applied potential varied from &#x2212;0.9 to &#x2212;1.0 V, the Fe content increased slightly from 52&#xa0;at. % to 53&#xa0;at. %, respectively. In general, the increase in Fe content as a function of overpotential is consistent with LSV data, in which, at higher overpotential, the current density of Fe deposition is higher, while the current density of Co electrodeposition remains approximately constant (<xref ref-type="fig" rid="F1">Figure 1</xref>). Unlike the deposited Fe content, the current efficiency significantly depended on the operating temperature and applied potential, where it decreased with the increase in temperature and cathodic potential (<xref ref-type="fig" rid="F6">Figure 6B</xref>).</p>
<fig id="F5" position="float">
<label>FIGURE 5</label>
<caption>
<p>Deposited Fe content <bold>(A)</bold> and current efficiency (CE) <bold>(B)</bold> of Fe<sub>x</sub>Co<sub>1-x</sub> thin films electrodeposited at different applied potentials. The electrolyte consisted of 15&#xa0;mM CoCl<sub>2</sub> &#x2b; 85&#xa0;mM FeCl<sub>3</sub>. The CE decreased with an increase in the deposition temperature, whereas the Fe content was independent of temperature.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g005.tif">
<alt-text content-type="machine-generated">Two line graphs show data related to varying temperatures. Graph (A) plots iron content (at.%) against potential (V vs. Ag) for 70&#xB0;C, 100&#xB0;C, and 130&#xB0;C. All temperatures show an increase in iron content as potential becomes more negative. Graph (B) plots current efficiency (%) against the same potential range for the same temperatures. Current efficiency decreases with more negative potential, with higher initial efficiency at lower temperatures.</alt-text>
</graphic>
</fig>
<fig id="F6" position="float">
<label>FIGURE 6</label>
<caption>
<p>Chronoamperograms of Fe<sub>x</sub>Co<sub>1-x</sub> electrodeposition at different temperatures: (I) 70&#x2009;&#xb0;C; (II) 100&#x2009;&#xb0;C; (III) 130&#x2009;&#xb0;C in the solution with 15&#xa0;mM CoCl<sub>2</sub> &#x2b; 85&#xa0;mM FeCl<sub>3</sub>. The applied potential and charge were fixed at &#x2212;0.9&#xa0;V and 6&#xa0;C, respectively. A silver wire was used as the reference electrode. As the deposition temperature increased, the deposition current increased as well.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g006.tif">
<alt-text content-type="machine-generated">Line graph showing current density (milliampere per square centimeter) versus time (minutes). Three colored lines represent experiments: black (I) around zero, blue (II) around negative two, and red (III) around negative four, all stabilizing over 150 minutes.</alt-text>
</graphic>
</fig>
<p>It is a well-known phenomenon that the less noble metal (Fe) deposits preferentially over the more noble metal (Co) in an aqueous solution, primarily due to complexation and adsorption effects (<xref ref-type="bibr" rid="B38">Gon&#xe7;alves et al., 2023</xref>; <xref ref-type="bibr" rid="B91">Zhou et al., 2012</xref>). Ferric ions can form complex ions with chloride, with the most common species in the aqueous solution being [FeCl<sub>4</sub>]<sup>-</sup>. At high chloride concentrations and under acidic conditions, the formation of [FeCl<sub>4</sub>]<sup>-</sup> is favored. This can shift the redox equilibrium between ferrous and ferric ions to the left, as shown in <xref ref-type="disp-formula" rid="e1">Equation 1</xref>, effectively increasing the electrode potential of the Fe<sup>3&#x2b;</sup>/Fe<sup>2&#x2b;</sup> couple. Additionally, the formation of such complexes further influences the redox potential.<disp-formula id="e1">
<mml:math id="m1">
<mml:mrow>
<mml:msup>
<mml:mtext>Fe</mml:mtext>
<mml:mrow>
<mml:mn>3</mml:mn>
<mml:mo>&#x2b;</mml:mo>
</mml:mrow>
</mml:msup>
<mml:mo>&#x2b;</mml:mo>
<mml:msup>
<mml:mi mathvariant="normal">e</mml:mi>
<mml:mo>&#x2010;</mml:mo>
</mml:msup>
<mml:mtext>&#x2009;</mml:mtext>
<mml:mo>&#x21cc;</mml:mo>
<mml:mtext>&#x2009;</mml:mtext>
<mml:msup>
<mml:mtext>Fe</mml:mtext>
<mml:mrow>
<mml:mn>2</mml:mn>
<mml:mo>&#x2b;</mml:mo>
</mml:mrow>
</mml:msup>
<mml:mo>.</mml:mo>
</mml:mrow>
</mml:math>
<label>(1)</label>
</disp-formula>
</p>
<p>Similarly, cobalt(II) ions can also form complexes with chloride ions, particularly [CoCl<sub>4</sub>]<sup>2-</sup>. The formation of [CoCl<sub>4</sub>]<sup>2-</sup> also contributes to a shift in the redox potential.</p>
<p>Anomalous electrodeposition in DESs has also been reported in the literature. The underlying causes are similar to those observed in aqueous solutions, where anomalous deposition is associated with ion complexation and reaction kinetics (<xref ref-type="bibr" rid="B22">Doneux et al., 2024</xref>). Additionally, mass transport limitations because of the high viscosity of DESs can restrict ion diffusion, thereby favoring the deposition of metal ions with faster electron transfer kinetics (<xref ref-type="bibr" rid="B8">Bernasconi et al., 2017</xref>).</p>
<p>
<xref ref-type="fig" rid="F7">Figure 7</xref> shows the XRD patterns of electrodeposited Fe<sub>X</sub>Co<sub>1-X</sub> films as a function of the applied potential at a fixed temperature of 70&#x2009;&#xb0;C. Electrodeposited films from &#x2212;0.7 to &#x2212;0.9&#xa0;V showed (110) a peak from body-centered cubic (BCC) FeCo and a (200) peak from &#x3b1;-Fe<sub>2</sub>O<sub>3</sub>. However, at an applied potential of &#x2212;1.0 V, the deposit only showed the BCC (110) peak. During the electrodeposition process, the Fe<sup>3&#x2b;</sup> ions will be absorbed to the electrode first, followed by electrochemical reduction at the electrode surface (<xref ref-type="bibr" rid="B23">Dulal et al., 2007</xref>). At a low applied potential, the electrochemical reduction rate might not be sufficient enough to reduce all the absorbed Fe<sup>3&#x2b;</sup> ions; therefore, a certain amount of Fe<sup>3&#x2b;</sup> ions remained in the electrodeposited Fe<sub>X</sub>Co<sub>1-X</sub>, which was confirmed by the &#x3b1;-Fe<sub>2</sub>O<sub>3</sub> peak. At an applied potential of &#x2212;1.0&#xa0;V, the reaction became mass transfer control, and the electrochemical reaction was high enough to reduce all of the absorbed Fe<sup>3&#x2b;</sup> ions on the electrode. This is probably the reason why there is no Fe<sub>2</sub>O<sub>3</sub> peak in the XRD data at an applied potential of &#x2212;1.0&#xa0;V.</p>
<fig id="F7" position="float">
<label>FIGURE 7</label>
<caption>
<p>X-ray diffraction patterns of electrodeposited Fe<sub>x</sub>Co<sub>1-x</sub> at different operating temperatures of applied potentials. At low temperature, iron oxides were co-deposited with the metallic film. At higher operating temperatures, metallic films were formed.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g007.tif">
<alt-text content-type="machine-generated">X-ray diffraction patterns at 130&#xB0;C, 100&#xB0;C, and 70&#xB0;C for voltages of -0.7 V, -0.8 V, -0.9 V, and -1.0 V. Each pattern shows intensity on the y-axis versus 2&#x3B8; degrees on the x-axis, displaying peaks at various angles.</alt-text>
</graphic>
</fig>
<p>As the deposition temperatures increased to 100&#x2009;&#xb0;C and 130&#x2009;&#xb0;C, the XRD patterns only showed a (110) peak. This is probably because the high temperature results in a higher electrochemical reaction rate, which makes it fast enough to reduce all the Fe<sup>3&#x2b;</sup> ions absorbed on the electrode.</p>
<p>The average grain size of the electrodeposited Fe<sub>X</sub>Co<sub>1-X</sub> films was estimated by the Scherrer equation. At the temperature of 70&#x2009;&#xb0;C, the average grain size of Fe<sub>X</sub>Co<sub>1-X</sub> was &#x223c;35&#xa0;nm at the applied potentials of &#x2212;0.7 and &#x2212;0.8 V; when the applied potential became more negative to &#x2212;0.9 and &#x2212;1.0 V, the average grain size reduced to &#x223c;30&#xa0;nm. At 100&#x2009;&#xb0;C, the average grain size increased from 31 to 37&#xa0;nm when the applied potential was increased from &#x2212;0.7 to &#x2212;0.8 V; however, when the applied potential further increased from &#x2212;0.9 to &#x2212;1.0 V, the average grain size maintained at approximately 37&#xa0;nm. At the temperature of 130&#x2009;&#xb0;C, the average grain size of Fe<sub>X</sub>Co<sub>1-X</sub> was approximately 35&#xa0;nm when the applied potential was &#x2212;0.7 and &#x2212;0.8 V, and it increased to 39&#xa0;nm when the applied potential was changed to &#x2212;1.0&#xa0;V. In summary, the overall variation of Fe<sub>X</sub>Co<sub>1-X</sub> grain size as a function of the applied potential and temperature is small, which is from &#x223c;29 to 39&#xa0;nm.</p>
<p>
<xref ref-type="fig" rid="F8">Figure 8</xref> shows the parallel magnetic hysteresis loops of Fe<sub>x</sub>Co<sub>1-x</sub> thin films electrodeposited at different temperatures (i.e., 70&#x2009;&#xb0;C and 130&#x2009;&#xb0;C). As expected, magnetic saturation (M<sub>s</sub>) showed a monotonic increase with increasing cathodic potential at 70&#x2009;&#xb0;C, whereas M<sub>s</sub> was less dependent on the applied potentials (<xref ref-type="fig" rid="F9">Figure 9A</xref>). The lower M<sub>s</sub> may be attributed to the presence of &#x3b1;-Fe<sub>2</sub>O<sub>3</sub> in the deposit. At high deposition temperature, only metallic Fe<sub>x</sub>Co<sub>1-X</sub> were electrodeposited with similar composition, resulting in similar M<sub>s.</sub> As shown in <xref ref-type="fig" rid="F9">Figures 9B, C</xref>, composite electrodeposited films showed greater squareness (M<sub>r</sub>/M<sub>s</sub>) and higher coercivity due to the co-existence of &#x3b1;-Fe<sub>2</sub>O<sub>3</sub> in the deposit.</p>
<fig id="F8" position="float">
<label>FIGURE 8</label>
<caption>
<p>Parallel magnetic hysteresis loops of Fe<sub>x</sub>Co<sub>1-x</sub> thin films electrodeposited at different temperatures (i.e., 70 &#xb0;C <bold>(A)</bold> and 130 &#xb0;C <bold>(B)</bold>). Magnetic properties are strongly influenced by impurity, composition and morphology.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g008.tif">
<alt-text content-type="machine-generated">Two graphs display magnetic moment versus magnetic field (H) for different voltages. Graph (A) shows hysteresis loops widening with more negative voltages, indicated by different colored lines: black (-0.7 V), red (-0.8 V), blue (-0.9 V), and green (-1.0 V). Graph (B) shows similar trends with curves converging at higher fields. The y-axis is moment in electromagnetic units per gram, and the x-axis is the magnetic field in Oersteds.</alt-text>
</graphic>
</fig>
<fig id="F9" position="float">
<label>FIGURE 9</label>
<caption>
<p>Magnetic saturation <bold>(A)</bold>, remanence <bold>(B)</bold>, and coercivity <bold>(C)</bold> of electrodeposited Fe<sub>x</sub>Co<sub>1-x</sub> at different operating temperatures of applied potentials.</p>
</caption>
<graphic xlink:href="fchem-13-1635084-g009.tif">
<alt-text content-type="machine-generated">Three graphs (A, B, C) plot magnetic properties against electrical potential (E) versus a silver electrode. Graph A shows saturation magnetization (Ms) in emu per gram, graph B shows the ratio of remanent magnetization to saturation magnetization (Mr/Ms), and graph C shows coercivity (Hc) in Oersteds. Two temperatures are compared: seventy degrees Celsius (open circles) and one hundred thirty degrees Celsius (solid squares). Each graph displays data points for various voltage values.</alt-text>
</graphic>
</fig>
<p>
<xref ref-type="sec" rid="s12">Supplementary Table S1</xref> compares the magnetic properties of electrodeposited FeCo thin films from both aqueous and DES baths. As shown in the table, the intrinsic magnetic saturation (M<sub>s</sub>) strongly depends on the film composition, regardless of the bath type. However, extrinsic coercivity (H<sub>c</sub>) is highly influenced by both the composition and deposition conditions, including the nature of the electrolyte solution (i.e., aqueous or DES).</p>
</sec>
<sec sec-type="conclusion" id="s4">
<title>Conclusion</title>
<p>Fe<sub>X</sub>Co<sub>1-X</sub> thin films were electrodeposited in a DES solution using Fe<sup>3&#x2b;</sup> and Co<sup>2&#x2b;</sup> as precursors without reducing agents or other additives. The films had a smooth compact morphology when the applied potential was at the kinetic controlled range, while the morphology shifted to a nanorod array when the deposition was carried out under mass transfer control. The composition of Fe<sub>X</sub>Co<sub>1-X</sub> films and current efficiency can be altered by varying the applied potential and deposition temperature. Generally, the Fe content increases first and then reaches a plateau when the applied potential varies from &#x2212;0.7 to &#x2212;1.0&#xa0;V. The increase in Fe content as a function of overpotential may be caused by a higher Fe deposition rate at high overpotential, which is consistent with LSV data. Most of the Fe<sub>X</sub>Co<sub>1-X</sub> electrodeposits from the DES show a body-centered cubic crystal structure with the preferred orientation of (110). All electrodeposited Fe<sub>X</sub>Co<sub>1-X</sub> films had small grains ranging from 29 to 39&#xa0;nm. At low temperatures and low cathodic potentials, co-deposition of iron oxide was observed. At higher cathodic potentials and elevated operating temperatures, the co-deposition of iron oxide was minimized or completely suppressed. The magnetic properties were strongly influenced by the presence of iron oxide.</p>
</sec>
</body>
<back>
<sec sec-type="data-availability" id="s5">
<title>Data availability statement</title>
<p>The original contributions presented in the study are included in the article/<xref ref-type="sec" rid="s12">Supplementary Material</xref>, further inquiries can be directed to the corresponding authors.</p>
</sec>
<sec sec-type="author-contributions" id="s6">
<title>Author contributions</title>
<p>TW: Writing &#x2013; original draft, Data curation. JK: Writing &#x2013; review and editing, investigation, Conceptualization. Y-HC: Conceptualization, Data curation, Funding acquisition, Writing &#x2013; review and editing. NM: Writing &#x2013; review and editing, Funding acquisition, Conceptualization, Project administration.</p>
</sec>

<sec sec-type="COI-statement" id="s8">
<title>Conflict of interest</title>
<p>The authors declare that the research was conducted in the absence of any commercial or financial relationships that could be construed as a potential conflict of interest.</p>
</sec>
<sec id="s9">
<title>Correction note</title>
<p>This article has been corrected with minor changes. These changes do not impact the scientific content of the article.</p>
</sec>
<sec sec-type="ai-statement" id="s10">
<title>Generative AI statement</title>
<p>The author(s) declare that no Generative AI was used in the creation of this manuscript.</p>
</sec>
<sec sec-type="disclaimer" id="s11">
<title>Publisher&#x2019;s note</title>
<p>All claims expressed in this article are solely those of the authors and do not necessarily represent those of their affiliated organizations, or those of the publisher, the editors and the reviewers. Any product that may be evaluated in this article, or claim that may be made by its manufacturer, is not guaranteed or endorsed by the publisher.</p>
</sec>
<sec sec-type="supplementary-material" id="s12">
<title>Supplementary material</title>
<p>The Supplementary Material for this article can be found online at: <ext-link ext-link-type="uri" xlink:href="https://www.frontiersin.org/articles/10.3389/fchem.2025.1635084/full#supplementary-material">https://www.frontiersin.org/articles/10.3389/fchem.2025.1635084/full&#x23;supplementary-material</ext-link>
</p>
<supplementary-material xlink:href="DataSheet1.pdf" id="SM1" mimetype="application/pdf" xmlns:xlink="http://www.w3.org/1999/xlink"/>
</sec>
<fn-group>
<fn fn-type="custom" custom-type="edited-by">
<p>
<bold>Edited by:</bold> <ext-link ext-link-type="uri" xlink:href="https://loop.frontiersin.org/people/609461/overview">Du Yuan</ext-link>, Changsha University of Science and Technology, China</p>
</fn>
<fn fn-type="custom" custom-type="reviewed-by">
<p>
<bold>Reviewed by:</bold> <ext-link ext-link-type="uri" xlink:href="https://loop.frontiersin.org/people/3079564/overview">Yao Meng</ext-link>, Sichuan University, China</p>
<p>
<ext-link ext-link-type="uri" xlink:href="https://loop.frontiersin.org/people/3087823/overview">Bakusele Kabane</ext-link>, Durban University of Technology, South Africa</p>
</fn>
</fn-group>
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